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Springer Copper Interconnect Technology - Engineering Book

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Description

Explore the transition from transistor-focused design to the modern era of interconnection importance. As circuit performance shifts away from being solely dependent on transistor properties, understanding the role of parasitic resistance, capacitance, and inductance becomes necessary for advancing nanoscale ULSI technology. This technical resource by Springer examines why metallic conductivity and resistance to electromigration in bulk copper (Cu) provide superior performance compared to traditional aluminum. It covers the widespread international use of copper and low-k materials in current microelectronics. For engineers and researchers working in nanotechnology and electrical engineering, this text provides a necessary look at the factors influencing the evolution of modern integrated circuits.

Key Features

Analyzes how parasitic resistance, capacitance, and inductance influence modern circuit performance and speed.

Compares the metallic conductivity and electromigration resistance of copper against traditional aluminum materials.

Provides technical insights into the evolution of nanoscale ULSI technology and microelectronics.

Discusses the prevalence of copper and low-k materials used in international microelectronics manufacturing.

Addresses the shift in focus from transistor properties to interconnection performance in circuit design.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
07 August 2009
Listed Since
30 January 2009

Barcode

No barcode data available

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