Materials and Processes for Next Generation Lithography (Frontiers of Nanoscience): Volume 11 - Image 1

£107.24

Elsevier Materials and Processes for Next Generation Lithography (Frontiers of Nanoscience): Volume 11

Name: Materials and Processes for Next Generation Lithography (Frontiers of Nanoscience): Volume 11
Brand: Elsevier
Price: 107.24 GBP
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Physical Chemistry

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Description

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place

Product Specifications

Brand: Elsevier
Format: hardcover
ASIN: 0081003544
Category: Books > Subjects > Science, Nature & Maths > Chemistry > Physical Chemistry
Domain: Amazon UK
Release Date: 01 September 2016
Listed Since: 02 May 2016

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Elsevier Materials and Processes for Next Generation Lithography (Frontiers of Nanoscience): Volume 11

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