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SPIE Press Optical Lithography for Semiconductor Patterning

Amazon

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Description

Explore the evolution of microchip fabrication with Optical Lithography for Advanced Semiconductor Patterning from SPIE Press. This monograph provides a detailed account of modern lithography during the first half of the 2020s, focusing on the introduction of high-NA extreme-ultraviolet lithography (EUVL). The text offers a comprehensive description of the various effects that impact optical image quality within the resist layer. As lithography tool generations advance, these complexities grow, making this resource a vital guide for understanding current industry shifts. Designed for readers with a graduate-level background in physics, chemistry, or mathematics, this book builds its discussion gradually to ensure clarity on the technical challenges of modern patterning processes.

Key Features

This SPIE Press monograph covers modern lithography developments from the first half of the 2020s.

The text provides a detailed account of high-NA extreme-ultraviolet lithography (EUVL) introduction.

Readers gain a comprehensive description of the effects impacting optical image quality inside the resist layer.

The material is structured for those with a graduate-level background in physics, chemistry, or mathematics.

The book tracks how lithography tool generations have increased the complexity of patterning processes.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
31 March 2025
Listed Since
24 March 2025

Barcode

No barcode data available

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