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Chemistry and Lithography, Vol. 2: Chemistry in Lithography

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Description

Chemistry and Lithography, Vol. 2 explores the chemical foundations of lithography by breaking the process down into essential chemical principles. This SPIE Press monograph situates various lithographic aspects within specific fields of chemistry to provide a clear technical understanding. The text is organized into five distinct parts: lithographic process chemistry, lithographic materials chemistry, lithographic photo- and radiation chemistry, chemistry of lithographic imaging mechanisms, and lithographic process-induced chemistry. As manufacturing moves through 10-nm and 7-nm technology nodes with the implementation of EUV lithography, understanding these chemical shifts is vital for addressing modern patterning challenges.

Key Features

This SPIE Press monograph provides a detailed exploration of the chemical basis of lithography.

The content is organized into five parts covering process, materials, photo- and radiation chemistry, imaging mechanisms, and process-induced chemistry.

The text deconstructs lithography into its essential chemical principles to situate aspects in specific chemistry fields.

The volume addresses patterning challenges relevant to 10-nm and 7-nm technology nodes and EUV lithography implementation.

Product Specifications

Format
paperback
Domain
Amazon UK
Release Date
01 September 2023
Listed Since
28 July 2023

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