Academic Press - Optical Diagnostics for Thin Film Processing

Explore the growing importance of in situ optical diagnostics in thin film processing through this comprehensive volume from Academic Press. This resource covers a wide range of applications, from fundamental science studies to process development and manufacturing control. A primary advantage highlighted is the noninvasive and nonintrusive nature of optical diagnostics. The text describes various optical probes used to monitor the surface, film, wafer, and gas above the wafer. It provides detailed coverage for several critical processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For every optical technique discussed, the book presents the underlying principles and modes of experimental implementation. This makes it a valuable reference for professionals and researchers looking to understand how optical methods can be used to monitor and control thin film production effectively.