Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films): Volume 23 - Image 1

£37.05

Academic Press Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films): Volume 23

Name: https://www.amazon.co.uk/dp/B0BZ29HYVP?tag=tosheroon-21
Brand: Academic Press
Price: 71.45 GBP
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Inorganic Chemistry

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Description

Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

Product Specifications

Brand: Academic Press
Format: hardcover
ASIN: 0125330235
Category: Books > Subjects > Science, Nature & Maths > Chemistry > Inorganic Chemistry
Domain: Amazon UK
Release Date: 01 September 1997
Listed Since: 25 January 2007

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Academic Press Advances in Research and Development: Modeling of Film Deposition for Microelectronic Applications: Vol. 23 (Thin Films): Volume 23

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