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Woodhead Publishing - In-Situ Characterisation of Thin Film Growth

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Description

Gain a deeper understanding of deposition processes with In-Situ Characterisation of Thin Film Growth. This comprehensive review explores recent advances in techniques used to monitor thin films during the deposition process. By utilizing in-situ characterization, researchers and engineers can achieve better and faster diagnosis of issues that occur during deposition. This volume is organized into three detailed sections to provide a structured learning experience. The first part focuses on electron diffraction techniques, including the specific methodologies required for taking accurate observations and measurements. The second part covers photoemission techniques, explaining both the underlying principles and the necessary instrumentation. Finally, the third part introduces alternative in-situ characterization techniques. This book serves as a vital resource for those looking to improve their understanding of thin film growth and the technologies used to monitor it in real time.

Key Features

Provides a comprehensive review of recent advances in techniques for characterizing thin films during the deposition process.

Offers detailed methodologies for electron diffraction techniques to assist with accurate observations and measurements.

Explains the fundamental principles and instrumentation behind photoemission techniques used in thin film research.

Covers alternative in-situ characterization techniques to broaden your technical knowledge of deposition monitoring.

Supports faster and more effective diagnosis of issues encountered during the thin film deposition process.

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