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Elsevier In-Situ Characterisation of Thin Film Growth - Woodhead Publishing

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£102.00 £96.90 £98.94 £100.98 £103.02 £105.06 £107.10 25 July 2026 12 August 2026 30 August 2026 17 September 2026 05 October 2026
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Description

In-Situ Characterisation of Thin Film Growth is a comprehensive technical resource examining advanced techniques for monitoring thin film deposition in real time. This Woodhead Publishing title explores how in-situ characterisation methods can improve understanding of deposition processes and enable rapid diagnosis of process issues. The book is organised into three main sections: part one reviews electron diffraction techniques with detailed methodology for observations and measurements; part two covers photoemission techniques including principles and instrumentation; part three presents alternative in-situ characterisation approaches. Aimed at materials scientists, engineers, and researchers working in thin film technology, this work bridges theoretical knowledge and practical application in electronics and optical materials development.

Key Features

Electron diffraction techniques section provides comprehensive methodology for taking accurate observations and measurements during thin film characterisation.

Photoemission techniques coverage explains both fundamental principles and practical instrumentation requirements for in-situ thin film analysis.

Alternative in-situ characterisation techniques are explored in part three to give readers multiple approaches to real-time deposition monitoring.

Published by Woodhead Publishing as part of their recognised Woodhead Publishing Series in Electronic and Optical Materials.

Enables improved understanding of deposition processes and faster diagnosis of issues that arise during thin film growth.

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