Woodhead Publishing - In-Situ Characterisation of Thin Film Growth

Gain a deeper understanding of deposition processes with In-Situ Characterisation of Thin Film Growth. This comprehensive review explores recent advances in techniques used to monitor thin films during the deposition process. By utilizing in-situ characterization, researchers and engineers can achieve better and faster diagnosis of issues that occur during deposition. This volume is organized into three detailed sections to provide a structured learning experience. The first part focuses on electron diffraction techniques, including the specific methodologies required for taking accurate observations and measurements. The second part covers photoemission techniques, explaining both the underlying principles and the necessary instrumentation. Finally, the third part introduces alternative in-situ characterization techniques. This book serves as a vital resource for those looking to improve their understanding of thin film growth and the technologies used to monitor it in real time.