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CRC Press Microscopy of Semiconducting Materials 1987 Book

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Description

Explore the advancements in semiconductor research with Microscopy of Semiconducting Materials 1987. This volume contains the proceedings from the Institute of Physics Conference held at Oxford University in April 1987. It serves as a technical record of how various forms of microscopy and microanalytical techniques contribute to the development of microelectronics technology. The text examines progress in semiconductor microscopy, focusing on electron probe methods, light optical techniques, and ion scattering methods. It provides a detailed look at the state of the art during its time, covering essential topics for researchers and students in analytical chemistry and materials science. Readers can find information regarding high resolution microscopy, epitaxial layers, and quantum wells. The book also addresses superlattices and bulk gallium arsenide, along with other semiconductor compounds. This collection is a valuable resource for understanding the foundational techniques that support modern microelectronics.

Key Features

Includes proceedings from the Institute of Physics Conference held at Oxford University in April 1987.

Covers essential electron probe methods, light optical techniques, and ion scattering methods for semiconductor research.

Provides technical details on high resolution microscopy and the study of epitaxial layers.

Contains research on quantum wells, superlattices, and bulk gallium arsenide compounds.

Offers a comprehensive look at the state of the art in microanalytical techniques for microelectronics.

Published by CRC Press for use in scientific research and analytical chemistry studies.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
01 October 1987
Listed Since
23 January 2007

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No barcode data available

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