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CRC Press Microscopy of Semiconducting Materials 1987 - Conference Proceedings

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Description

Microscopy of Semiconducting Materials 1987 presents the proceedings from the Institute of Physics Conference held at Oxford University in April 1987, offering comprehensive coverage of microscopy techniques and microanalytical methods applied to semiconductor research and development. This landmark publication explores the progress in semiconductor microscopy across multiple disciplines, including high-resolution electron probe methods, light optical techniques, and ion scattering approaches. The conference proceedings examine critical areas such as epitaxial layers, quantum wells, superlattices, bulk gallium arsenide, and other semiconductor compounds that were shaping microelectronics technology during this period. Published by CRC Press, this volume captures the state of the art in semiconductor microscopy from leading researchers and practitioners gathered at Oxford, providing essential historical and technical insights into advanced microscopy applications within semiconductor science.

Key Features

Covers high-resolution microscopy techniques and electron probe methods applied to semiconductor materials and research applications.

Includes detailed examination of epitaxial layers, quantum wells, and superlattices in semiconductor structures.

Presents proceedings from the Institute of Physics Conference held at Oxford University in April 1987.

Explores light optical and ion scattering techniques alongside electron microscopy for semiconductor analysis.

Addresses bulk gallium arsenide and other compound semiconductors used in microelectronics technology.

Published by CRC Press as a comprehensive reference for semiconductor microscopy state of the art research.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
01 October 1987
Listed Since
23 January 2007

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