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Elsevier PVD for Microelectronics: Sputter Deposition to Semiconductor Manufacturing

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Description

Physics of Thin Films Volume 26 continues the legacy of this prestigious scientific series, which has delivered authoritative studies on thin film properties and systems since 1963. This volume focuses on physical vapour deposition (PVD) techniques essential to microelectronics manufacturing, covering sputter deposition processes and their applications in semiconductor production. As the series has evolved beyond fundamental physics to encompass modern technological aspects, this edition addresses both theoretical foundations and practical implementation of PVD methods critical to the electronics industry. Academic Press presents cutting-edge research on inorganic thin film systems, their characterisation, and deployment in contemporary microelectronics fabrication. This comprehensive resource serves engineers, physicists, and materials scientists seeking advanced knowledge of deposition technologies that drive semiconductor innovation and device performance.

Key Features

Volume 26 of the Physics of Thin Films series from Academic Press, part of a 25-volume legacy spanning thin film science since 1963.

Comprehensive coverage of physical vapour deposition (PVD) and sputter deposition techniques applied to semiconductor manufacturing processes.

Addresses both theoretical physics and practical technological aspects of inorganic thin films in microelectronics applications.

Contains quality peer-reviewed studies on thin film properties, materials systems, and modern manufacturing methodologies for advanced semiconductors.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
02 November 1998
Listed Since
11 December 2006

Barcode

No barcode data available

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