£145.38

Springer - Physics and Chemistry of SiO2 and Si-SiO2 Interface 2

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Description

Explore advanced scientific research in this specialized volume from Springer. This book documents the second international symposium on the Physics and Chemistry of SiO2 and the Si-SiO2 Interface, which took place from May 18-21, 1992, in St. Louis, Missouri. Organized in association with the Electrochemical Society, Inc., this collection follows the success of the inaugural 1988 symposium in Atlanta, Georgia. Because of the high level of interest and scientific value, the sponsoring Electronics and Dielectrics Science and Technology Divisions established this symposium as a recurring event held every four years. This publication serves as a vital resource for professionals and students in the fields of inorganic chemistry and materials science. It provides a formal record of the scientific discussions and research presented during the 1992 meeting, making it a key reference for those studying silicon dioxide and semiconductor interfaces.

Key Features

Covers the second international symposium held in St. Louis, Missouri, focusing on SiO2 and Si-SiO2 interface research.

Published by Springer, a leading name in scientific and technical literature for academic and professional use.

Developed in association with the Electrochemical Society, Inc. to ensure high standards of scientific content.

Sponsored by the Electronics and Dielectrics Science and Technology Divisions for specialized technical accuracy.

Serves as a continuing record of a symposium series scheduled every four years by industry professionals.

Product Specifications

Format
paperback
Domain
Amazon UK
Release Date
19 November 2013
Listed Since
18 April 2014

Barcode

No barcode data available

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