£113.05

Springer - Dry Etching for VLSI - Applied Physics Book

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Description

Dry Etching for VLSI is a specialized scientific volume published by Springer as part of a series by Plenum Press. This book focuses on the field of dry (plasma) etching and its specific applications in silicon semiconductor processing. It is designed to provide a comprehensive review of this technical topic for researchers and professionals in the field of applied physics and electrical technology. To aid your research and study, this volume includes reprinted abstracts of the most important references cited throughout the text. This feature allows you to access in-depth material and explore related studies without the need to search through many different additional publications. By consolidating these key references, the book serves as a streamlined resource for understanding the physics and chemistry involved in semiconductor processing techniques.

Key Features

Focused subject matter regarding dry (plasma) etching applications in silicon semiconductor processing.

Part of a professional scientific series published by Plenum Press to review specific technical topics.

Includes reprinted abstracts of major references to help you find in-depth material quickly.

Reduces the need to search through multiple additional publications for research support.

4036834090043

Product Specifications

Format
Paperback
Domain
Amazon UK
Publication Date
29 May 2013
Listed Since
07 November 2013

Barcode

No barcode data available

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