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Springer Dry Etching for VLSI - Springer Applied Physics Guide

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Description

Dry Etching for VLSI is a comprehensive scientific reference from Springer that examines plasma etching techniques essential to silicon semiconductor processing. Part of the Updates in Applied Physics and Electrical Technology series, this volume provides in-depth coverage of dry etching methods used in VLSI manufacturing. The book includes abstracts of the most important references cited throughout the text, enabling readers to access detailed technical material without consulting numerous additional publications. Ideal for engineers, physicists, and semiconductor professionals seeking authoritative knowledge of plasma etching principles and applications in modern microelectronics fabrication.

Key Features

Springer-published scientific reference covering plasma etching techniques for silicon semiconductor processing and VLSI applications.

Includes abstracts of key references throughout the text to provide quick access to supplementary technical material and research.

Part of the Updates in Applied Physics and Electrical Technology series, delivering specialized knowledge on dry etching methods.

Addresses both physics and chemistry aspects of dry etching to give comprehensive understanding of the field.

Product Specifications

Format
paperback
Domain
Amazon UK
Publication Date
29 May 2013
Listed Since
07 November 2013

Barcode

No barcode data available

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