£155.00

Metrology, Inspection, and Process Control for Microlithography XXVI

Applied Optics

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Description

Access specialized technical knowledge with Metrology, Inspection, and Process Control for Microlithography XXVI. This volume covers the proceedings from the conference held on 13-16 February 2012 in San Jose, California. As a key resource for professionals in electronics and communications engineering, it provides a focused look at the advancements in applied optics and lithography processes. Published by SPIE Press, this book serves as a technical reference for those working within the fields of electronics engineering and semiconductor manufacturing. It captures the developments and discussions from the San Jose meeting, making it a valuable addition to any professional library focused on engineering and technology. The content is categorized under science, nature, and mathematics, specifically targeting the intersection of applied optics and electronics engineering.

Key Features

Comprehensive proceedings from the Microlithography XXVI conference held in San Jose, California.

Technical insights focused on metrology, inspection, and process control within the microlithography field.

Published by SPIE Press, a recognized name in scientific and engineering literature.

Relevant for professionals specializing in electronics and communications engineering.

Provides a deep dive into topics related to applied optics and semiconductor technology.

Product Specifications

Format: paperback
ASIN: 0819489808
Category: Books > Subjects > Science, Nature & Maths > Engineering & Technology > Electronics & Communications Engineering > Electronics Engineering > Applied Optics
Domain: Amazon UK
Release Date: 15 June 2012
Listed Since: 10 November 2012

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Metrology, Inspection, and Process Control for Microlithography XXVI

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