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Alternative Lithographic Technologies IV - SPIE Proceedings

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Description

Access specialized research from the Alternative Lithographic Technologies IV conference held in San Jose, California. This volume captures the proceedings from February 13-16, 2012, providing a technical record of advancements in the field. Published by SPIE, this text serves as a resource for professionals and students focused on applied optics and electronics engineering. This collection covers topics relevant to the evolution of lithographic methods and their applications in modern technology. It is a valuable addition to any technical library specializing in science, nature, and mathematics. By documenting the discussions and findings from the San Jose event, this book offers a historical and technical perspective on the development of lithographic technologies within the engineering community.

Key Features

Comprehensive record of the Alternative Lithographic Technologies IV conference held in San Jose, California.

Published by SPIE, a leading source for information in optics and photonics.

Covers technical developments from the February 13-16, 2012, event sessions.

Relevant for researchers in applied optics and electronics engineering.

Provides specialized content for science, nature, and mathematics academic studies.

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