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CRC Press Strain-Engineered MOSFETs Engineering Book

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Description

Strain-Engineered MOSFETs by CRC Press provides a detailed look at the primary technique used to enhance advanced silicon-based metal-oxide-semiconductor field-effect transistors. Written from an engineering application standpoint, this text introduces promising strain techniques for fabrication and outlines methods to assess their applications. Readers gain the physical insight and background necessary to understand new developments in the modeling and design of n- and p-MOSFETs at the nanoscale. This resource focuses on recent developments in the field, making it a valuable asset for those studying or working with high-performance semiconductor technology.

Key Features

This CRC Press book covers strain engineering techniques used to improve advanced silicon-based MOSFET performance.

The text provides an engineering application standpoint for fabricating strain-engineered MOSFETs.

Learn specific methods to assess the applications of various strain techniques used in semiconductor fabrication.

Gain the physical insight required to understand the modeling and design of n- and p-MOSFETs at the nanoscale.

Explore recent developments in the field of strain engineering for advanced transistor technology.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
28 November 2012
Listed Since
16 September 2011

Barcode

No barcode data available

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