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CRC Press Strain-Engineered MOSFETs - Engineering Textbook

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Description

Improve your understanding of advanced semiconductor technology with Strain-Engineered MOSFETs by CRC Press. As silicon-based metal-oxide-semiconductor field-effect transistors continue to evolve, strain engineering has become the primary technique for enhancing performance. This book offers a practical look at these advancements from an engineering application standpoint. Readers will learn about the specific strain techniques used to fabricate these transistors and the methods available to assess their real-world applications. The text provides the necessary physical insight and background to navigate new developments in the design and modeling of both n-MOSFETs and p-MOSFETs at the nanoscale. Whether you are studying current fabrication methods or looking toward future developments in electrical engineering, this resource provides the technical foundation required for modern semiconductor research and design.

Key Features

Provides a practical engineering application standpoint for understanding modern strain techniques in MOSFET fabrication.

Explains various methods used to assess the application and effectiveness of strain engineering in semiconductor devices.

Delivers essential physical insight for the modeling and design of n- and p-MOSFETs at the nanoscale.

Covers recent developments in silicon-based metal-oxide-semiconductor field-effect transistors to support advanced research.

Serves as a technical resource for understanding the background and future of advanced semiconductor performance enhancement.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
28 November 2012
Listed Since
16 September 2011

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