£107.43

Springer - PMOS Negative Bias Temperature Instability Book

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Description

Negative Bias Temperature Instability (NBTI) remains a significant reliability challenge for CMOS transistors and circuits. This technical book by Springer provides an in-depth look at recent advances in the field, making it an essential resource for researchers and professionals working in semiconductor device engineering. To develop NBTI resilient technology, engineers must utilize suitable stress conditions, artifact-free measurements, and accurate physics-based models. This text helps readers achieve reliable determination of degradation at end-of-life by examining how various factors influence device performance. It offers a deep dive into the impacts of process, material, and device architecture on stability. By exploring ultra-fast measurements and advanced modeling techniques, this book supports the development of more reliable semiconductor technologies. Whether you are studying device architecture or material impacts, this publication provides the necessary technical foundation for understanding and mitigating NBTI in modern electronic systems.

Key Features

Provides advanced insights into Negative Bias Temperature Instability (NBTI) specifically for PMOS devices.

Helps researchers and professionals understand the impact of device architecture, material, and process on reliability.

Covers essential methods for ultra-fast measurements to ensure artifact-free data collection.

Discusses accurate physics-based models used to determine degradation at the end-of-life.

Supports the development of NBTI resilient technology through detailed technical analysis.

Serves as a specialized resource for those working in the semiconductor devices and CMOS circuits areas.

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