Handbook of Chemical Vapor Deposition (Materials Science and Process Technology Series): Principles, Technology, and Applications (Materials Science and Process Technology Series) - Image 1

£133.85

William Andrew Handbook of Chemical Vapor Deposition (Materials Science and Process Technology Series): Principles, Technology, and Applications (Materials Science and Process Technology Series)

Name: Handbook of Chemical Vapor Deposition (Materials Science and Process Technology Series): Principles, Technology, and Applications (Materials Science and Process Technology Series)
Brand: William Andrew
Price: 137.04 GBP
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Architecture & Microprocessors

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Description

Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Product Specifications

Brand: William Andrew
Format: Hardcover
ASIN: 0815514328
Category: Books > Subjects > Computing & Internet > Computer Science > Architecture & Microprocessors
Domain: Amazon UK
Release Date: 01 May 1999
Listed Since: 16 December 2006

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William Andrew Handbook of Chemical Vapor Deposition (Materials Science and Process Technology Series): Principles, Technology, and Applications (Materials Science and Process Technology Series)

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