We can't find the internet
Attempting to reconnect
Something went wrong
Hang in there while we get back on track
£162.57
This is the usual price. Wait for it to drop, or tell us your number.
£163 today · usual range £135–£163 · best ever £135
Springer Principles of Chemical Vapor Deposition - Springer
We'll watch every seller, every day. One email when your price arrives.
Price History & Forecast
Grey patches = out of stock. Cheaper = lower on the chart. Hover for exact prices.
Last 23 days · 23 data points (no recent data)
NEW HERE?
Amazon shows you one price. We show you all of them.
Tosheroon watches Amazon prices so you don't have to. Every product on Amazon has a price history — we make it visible. Set the price you'd actually pay, and we'll email you the second it gets there. No app, no account, one email.
WHAT'S ON THIS PAGE
when this has been cheap or pricey
where the price is heading next
all-time high & low, recent range
name your number, we'll email you
Price Distribution
Price distribution over 23 days • 2 price levels
Price Analysis
Most common price: £163 (19 days, 82.6%)
Price range: £135 - £163
Price levels: 2 different prices over 23 days
Description
Key Features
Covers essential CVD fundamentals including heat and mass transfer principles applicable to reactor design and process optimisation.
Explains surface chemistry and gas phase reactions critical to understanding film deposition mechanisms in chemical vapor deposition systems.
Discusses plasma discharge characteristics relevant to plasma-enhanced CVD processes and equipment selection.
Includes practical reactor and film examples to support the development of improved CVD processes and equipment solutions.
Designed to help CVD practitioners comprehend technical literature and research in the chemical vapor deposition field.
Product Specifications
- Brand
- Springer
- Format
- paperback
- ASIN
- 9048162777
- Domain
- Amazon UK
- Release Date
- 01 December 2010
- Listed Since
- 14 June 2010
Barcode
No barcode data available
Similar Products You Might Like
Principles of Chemical Vapor Deposition
Springer
Handbook of Chemical Vapor Deposition (Materials Science and Process Technology Series): Principles, Technology, and Applications (Materials Science and Process Technology Series)
Elsevier
Decomposition Methods in Multiphysics & Multiscale Problems: Models & Simulation (Physics Research and Technology)
Chemical Vapour Deposition: Precursors, Processes and Applications
Royal Society of Chemistry
Chemical Vapour Deposition: Growth processes on an atomic level (IOP ebooks)
Handbook of Deposition Technologies for Films and Coatings: Science, Applications and Technology
Elsevier
Handbook of Physical Vapor Deposition (PVD) Processing
Elsevier
Handbook of Physical Vapor Deposition (PVD) Processing
Elsevier
Elsevier Diamond Chemical Vapor Deposition Book - CVD Growth
Elsevier
Borophosphosilicate Glass Thin Films in Electronics (Materials Science and Technologies: Electronics and Telecommunications Research)
Nova Science Publishers Inc
Vacuum Deposition onto Webs, Films and Foils - Elsevier
Elsevier
Wiley Photochemical Vapor Deposition - Analytical Chemistry
Wiley
The Foundations of Vacuum Coating Technology
Elsevier
Lecture Notes on Principles of Plasma Processing
Springer
Handbook of Physical Vapor Deposition (PVD) Processing
Elsevier
Cold Plasma Materials Fabrication: From Fundamentals to Applications
Wiley
Principles and Fundamentals of Electrodeposition of Copper: Electrodeposition of copper
LAP Lambert Academic Publishing
Vacuum Deposition onto Webs, Films, and Foils (Materials Science and Process Technology)
Elsevier
Fluid Metals: The Liquid-Vapor Transition of Metals (Physical Chemistry: Science and Engineering)
Princeton University Press