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Wiley Resolution Enhancement Techniques in Optical Lithography - SPIE

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Description

Optical lithography for integrated circuits is currently experiencing a renaissance due to the adoption of Resolution Enhancement Technology (RET). As manufacturing processes evolve, several RET concepts have moved from experimental stages to becoming routine parts of the production cycle. This volume from the SPIE Milestone Series provides a comprehensive look at these developments. This book serves as a specialized collection that gathers together seminal RET papers. It is designed for professionals and students working within the fields of applied optics, electronics engineering, and integrated circuit manufacturing. By studying these foundational papers, readers can gain a deeper understanding of the techniques that drive modern lithography and help push the limits of semiconductor fabrication. This text is an essential resource for anyone studying the intersection of engineering and technology in the semiconductor industry.

Key Features

Gathers seminal RET papers in one comprehensive volume for professional study.

Covers key Resolution Enhancement Technology concepts used in modern manufacturing.

Provides deep insight into the renaissance of optical lithography for integrated circuits.

Serves as a technical resource for electronics and communications engineering professionals.

Part of the respected SPIE Milestone Series for applied optics and engineering.

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