£127.74

Chemical Vapor Deposition (CVD): Methods and Technologies (Chemical Engineering Methods and Technology)

Chemistry

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Description

Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate.

Product Specifications

Format: hardcover
ASIN: 1536199494
Category: Books > Subjects > Science, Nature & Maths > Chemistry
Domain: Amazon UK
Release Date: 17 August 2021
Listed Since: 30 July 2021

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Chemical Vapor Deposition (CVD): Methods and Technologies (Chemical Engineering Methods and Technology)

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