Elsevier Plasma Processing for Semiconductor Materials and Thin-Film Devices: Deposition, Surface Modification, and Etching (Vacuum and Thin-Film Deposition Technologies)

Plasma Processing for Semiconductor Materials and Thin-Film Devices covers the state-of-the-art in plasma processing of thin films. The book focuses on fundamental plasma theory, plasma for advanced applications, advanced characterization techniques, plasma and performance in semiconductor devices, and plasma processing. Sections consider the fundamental physics of plasma then move to advanced applications in the processing of semiconductor materials and their relation to the performance of semiconductor thin film devices. Subsequently, the book investigates the adoption of plasma for advanced (including thin film) characterization methods, finally addressing emerging plasma technologies such as liquid plasma, cold atmospheric plasma, and advanced plasma techniques. This book will be of interest to students, researchers, and practitioners in any field that utilizes plasma processing, since its chapters have been written by leading authorities from both academia and industry. Brings together fundamental knowledge on thin film growth at the atomic scale, the macroscopic concepts of thin film growth, and the basic knowledge of plasma physics and chemistry Covers state-of-the-art plasma technology for processing and characterizing advanced and emerging semiconductor materials and thin film devices Explores a wide range of plasma technologies for advanced engineering applications