Woodhead Publishing Nanolithography: The Art of Fabricating Nanoelectronics, Nanophotonics and Nanobiology Devices and Systems (Woodhead Publishing Series in Electronic ... and Nanophotonic Devices and Systems

Lithography is the process of patterning and etching to create integrated circuits and other devices on semiconductor wafers. Photolithography cannot be scaled down much further so in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions, scientists have turned to alternative nanolithography technologies. In addition to scaling issues, the increasing integration of multiple functions within a single device poses further challenges which drive innovations in nanolithography and nanofabrication. Chapters cover lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography, and applications of nanolithography in nanoelectronics, nanophotonics and microfluidics. Key Features: outlines the current state of the art in alternative nanolithography technologies in order to cope with the future reduction in size of semiconductor chips to nanoscale dimensions; covers lithographic techniques, including optical projection, extreme ultraviolet (EUV), nanoimprint, electron beam and ion beam lithography; describes the emerging applications of nanolithography in nanoelectronics, nanophotonics and microfluidics. Contents: Optical projection lithography; Extreme ultraviolet (EUV) lithography; Electron beam lithography; Focused ion beams for nano-machining and imaging; Masks for micro- and nanolithography; Maskless photolithography; Chemistry and processing of resists for nanolithography; Directed assembly nanolithography; Nanoimprint lithography; Nanostructures: Fabrication and applications; Nanophotonics: Devices for manipulating light at the nanoscale; Nanodevices: Fabrication, prospects for low dimensional devices and applications; Microfluidics: Fabrication technologies, interconnect approaches and applications; Modeling of nanolithography processes; Mask-substrate alignment via interferometric moiré fringes; Sidewall roughness in nanolithography: Origins, metrology and device effects; New applications and emerging technologies in nanolithography.