£140.00

Photomask Technology 2012 - SPIE Press Engineering Book

Applied Optics

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Description

Photomask Technology 2012 provides specialized knowledge for professionals and students in the field of electronics and communications engineering. Published by SPIE Press, this text is a dedicated resource for those studying applied optics and the technical aspects of photomask development. This book serves as a targeted reference for the engineering and technology sector. It is designed to support academic research and industrial application within the realms of electronics engineering. By focusing on the specific requirements of photomask technology, it offers a structured way to approach complex topics in applied optics. Whether you are working in a laboratory setting or studying advanced engineering principles, this publication provides the technical foundation necessary for understanding modern lithography and optical processes.

Key Features

Published by SPIE Press, a recognized source for high-quality technical and scientific literature.

Targeted specifically for the electronics and communications engineering disciplines.

Provides essential reading for those specializing in applied optics and lithography processes.

A specialized resource for engineering students and professional researchers in the technology sector.

Covers technical subject matter relevant to modern electronics manufacturing and optical engineering.

Product Specifications

Format: paperback
ASIN: 0819492604
Category: Books > Subjects > Science, Nature & Maths > Engineering & Technology > Electronics & Communications Engineering > Electronics Engineering > Applied Optics
Domain: Amazon UK
Release Date: 15 November 2012
Listed Since: 10 November 2012

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Photomask Technology 2012 - SPIE Press Engineering Book

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