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Photomask Technology 2011 - SPIE Press Engineering

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Last 51 days · 51 data points (no recent data)

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£174.00 £165.30 £168.78 £172.26 £175.74 £179.22 £182.70 24 July 2026 05 August 2026 18 August 2026 30 August 2026 12 September 2026
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Price distribution over 51 days • 1 price levels

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51 days 0 13 26 38 51 £174 Days at Price

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Most common price: £174 (51 days, 100.0%)

Price range: £174 - £174

Price levels: 1 different prices over 51 days

Description

Photomask Technology 2011 from SPIE Press provides comprehensive coverage of advanced photomask engineering and applied optics principles essential for electronics manufacturing and precision optical systems. This technical resource explores cutting-edge developments in photomask design, fabrication, and application within the semiconductor and electronics industries. Ideal for engineers, researchers, and professionals working in optical systems, electronics engineering, and advanced manufacturing, this book delivers in-depth analysis of photomask technology innovations and practical implementations. SPIE Press publications are recognised standards in optical and electronics engineering literature, offering authoritative insights into complex technical subjects. Whether you are developing optical solutions, advancing semiconductor processes, or specialising in applied optics, this 2011 edition captures essential knowledge from leading experts in the field.

Key Features

SPIE Press publication delivering authoritative technical content on photomask engineering and applied optics for electronics professionals.

Comprehensive coverage of photomask technology innovations relevant to semiconductor manufacturing and precision optical systems design.

Engineering-focused resource ideal for researchers, optical engineers, and electronics specialists seeking advanced technical knowledge.

In-depth exploration of photomask fabrication methods and optical system applications within modern electronics industries.

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