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Elsevier Ion Implantation into Semiconductors and Oxides Vol 85

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Description

This academic volume contains the reviewed papers from the Symposium J on Ion Implantation into Semiconductors, Oxides and Ceramics. Held during the Spring Meeting of the European Materials Research Society in Strasbourg, France, this collection represents a significant gathering of scientific research in the field of ion beam techniques. With 110 contributions from authors representing 31 nations across 5 continents, this publication serves as a comprehensive record of the importance of ion beam research. It provides a dedicated forum for discussing new results in the implantation of materials, making it an essential resource for researchers and professionals in physical chemistry and materials science. This volume is part of the European Materials Research Society Symposia Proceedings series, documenting high-level scientific exchange and technical advancements in semiconductor and ceramic research.

Key Features

Includes reviewed papers from the European Materials Research Society Symposium J held in Strasbourg, France.

Contains 110 scientific contributions covering research in semiconductors, oxides, and ceramics.

Features global perspectives with research from authors across 31 nations and 5 continents.

Provides a detailed record of the importance of ion beam techniques in modern materials research.

Serves as Volume 85 in the European Materials Research Society Symposia Proceedings series.

Offers a technical forum for discussing new results in the implantation of various materials.

Product Specifications

Model
index
Format
hardcover
Domain
Amazon UK
Release Date
05 March 1999
Listed Since
06 February 2007

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