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Elsevier Ion Implantation into Semiconductors, Oxides and Ceramics - Volume 85

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19 days 55 days 1 day · current 15 days 0 14 28 41 55 £124 £126 £134 £139 Days at Price

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Description

This comprehensive proceedings volume collects reviewed papers from Symposium J on ion implantation into semiconductors, oxides and ceramics, held at the European Materials Research Society Spring Meeting in Strasbourg, France in June 1998. Drawing contributions from 110 authors across 31 nations and 5 continents, this was the largest in a series of E-MRS ion beam symposia, reflecting the growing importance of ion beam techniques in materials research. The symposium provided a forum for discussing new results and advances in ion implantation methods, making this volume an essential reference for materials scientists, physicists and researchers working with ion beam technologies and semiconductor processing.

Key Features

Volume 85 in the European Materials Research Society Symposia Proceedings series documents ion implantation research across semiconductors, oxides and ceramics.

Contains peer-reviewed papers from 110 contributions submitted by leading researchers from 31 nations across 5 continents.

Published by Elsevier Science, this proceedings volume captures the state of ion beam techniques and applications in materials engineering.

Represents the largest symposium in the E-MRS ion beam series, demonstrating the critical role of ion implantation in modern materials science.

Product Specifications

Model
index
Format
hardcover
Domain
Amazon UK
Release Date
05 March 1999
Listed Since
06 February 2007

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