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CRC Press Tribology in Chemical-Mechanical Planarization Book

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Description

Explore the fundamental role of friction and contact in wear and planarization processes with Tribology in Chemical-Mechanical Planarization by CRC Press. This technical resource provides a detailed account of CMP technology, specifically focusing on its application to nanosurfaces. The text is designed to serve a wide range of professionals, including tribology experts, chemists, materials scientists, and physicists. Engineers working in the semiconductor and microelectronics sectors will find this book essential for understanding the mechanics of material surfaces. The content is structured to provide depth, with the first half of the volume dedicated to the CMP process itself. This book offers the specialized knowledge required to master the complexities of chemical-mechanical planarization in modern engineering applications.

Key Features

This CRC Press book provides a detailed account of the Chemical-Mechanical Planarization (CMP) process.

The text focuses on how friction and contact influence wear and planarization on nanosurfaces.

Content is written for tribology professionals, chemists, materials scientists, and physicists.

The book serves as a technical resource for engineers in the semiconductor and microelectronics fields.

The first half of the volume is dedicated specifically to the study of CMP technology.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
27 September 2019
Listed Since
10 February 2007

Barcode

No barcode data available

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