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LAP Lambert Academic Publishing Study of point defects in solids and thin films: Defect and diffusion study in FCC metals and dilute alloys

Name: Study of point defects in solids and thin films: Defect and diffusion study in FCC metals and dilute alloys
Brand: LAP Lambert Academic Publishing
Price: 66.0 GBP
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Physics

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Description

The study on defect and diffusion is an important area due to its present status in technology and so this book has its relevance still now. From the theoretical point of view Lattice Statics and Atomistic Continual Models in chapter one have produced, with all their approximations, some interesting and quite consistent results for relaxations due to a vacancy, its formation energies and divacancy binding energy in some FCC metals. Pseudopotential approach of chapter two produces general formulations for the calculation of defect parameters in case of vacancy in FCC metals for self and impurity diffusion. In the third chapter the experimental measurement of impurity diffusion parameters in Pb-Sn system is shown. The results are consistent with earlier experiments and theoretical values by pseudopotential method. To understand the kinetic behaviour of interfacial reactions in Ag-Sn thin film couples the contact and composite resistance measurements are done which indicate that interfacial reactions start at room temperature. X-ray diffraction indicates the growth of γ-Ag3Sn phase immediately after deposition and TEM and SEM studies confirm its presence.

Product Specifications

Brand: LAP Lambert Academic Publishing
Format: paperback
ASIN: 3847318012
Category: Books > Subjects > Science, Nature & Maths > Physics
Domain: Amazon UK
Release Date: 04 January 2012
Listed Since: 09 January 2012

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LAP Lambert Academic Publishing Study of point defects in solids and thin films: Defect and diffusion study in FCC metals and dilute alloys

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It has never been this cheap. We have no record of a lower price.

LAP Lambert Academic Publishing Study of point defects in solids and thin films: Defect and diffusion study in FCC metals and dilute alloys

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