Study of Atomic Layer Deposited HfO2/Si Interfaces: For their Quality Reliability and Radiation based Interface Modifications - Image 1

£56.00

LAP Lambert Academic Publishing Study of Atomic Layer Deposited HfO2/Si Interfaces: For their Quality Reliability and Radiation based Interface Modifications

Name: Study of Atomic Layer Deposited HfO2/Si Interfaces: For their Quality Reliability and Radiation based Interface Modifications
Brand: LAP Lambert Academic Publishing
Price: 56.0 GBP
Availability: InStock

Electronics Engineering

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Product Specifications

Brand: LAP Lambert Academic Publishing
Format: Paperback
ASIN: 6139909503
Category: Books > Subjects > Science, Nature & Maths > Engineering & Technology > Electronics & Communications Engineering > Electronics Engineering
Domain: Amazon UK
Release Date: 01 August 2019
Listed Since: 25 August 2019

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LAP Lambert Academic Publishing Study of Atomic Layer Deposited HfO2/Si Interfaces: For their Quality Reliability and Radiation based Interface Modifications

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