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Elsevier High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications

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Description

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution. Includes a comprehensive description of the HiPIMS process from fundamental physics to applications Provides a distinctive link between the process plasma and thin film communities Discusses the industrialization of HiPIMS and its real world applications

Key Features

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications

Product type: ABIS BOOK

Brand: Elsevier

Product Specifications

Format
paperback
Domain
Amazon UK
Release Date
03 September 2019
Listed Since
10 April 2019

Barcode

No barcode data available

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