We can't find the internet
Attempting to reconnect
Something went wrong
Hang in there while we get back on track
£139.49
Elsevier High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications
Price data last checked 59 day(s) ago - refreshing...
We'll watch every seller, every day. One email when your price arrives.
This is the most expensive it has ever been. Walk away.
£139 today · previous high £139 · all-time low £139
NEW HERE?
Amazon shows you one price. We show you all of them.
Tosheroon watches Amazon prices so you don't have to. Every product on Amazon has a price history — we make it visible. Set the price you'd actually pay, and we'll email you the second it gets there. No app, no account, one email.
WHAT'S ON THIS PAGE
when this has been cheap or pricey
where the price is heading next
all-time high & low, recent range
name your number, we'll email you
Price History & Forecast
Grey patches = out of stock. Cheaper = lower on the chart. Hover for exact prices.
Last 32 days · 32 data points (no recent data)
Price Distribution
Price distribution over 32 days • 1 price levels
Price Analysis
Most common price: £139 (32 days, 100.0%)
Price range: £139 - £139
Price levels: 1 different prices over 32 days
Description
Key Features
High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications
Product type: ABIS BOOK
Brand: Elsevier
Product Specifications
- Brand
- Elsevier
- Format
- paperback
- ASIN
- 0128124547
- Domain
- Amazon UK
- Release Date
- 03 September 2019
- Listed Since
- 10 April 2019
Barcode
No barcode data available
Similar Products You Might Like
Reactive Sputter Deposition: 109 (Springer Series in Materials Science, 109)
Springer
Handbook of Sputtering Technology: Fundamentals and Applications for Functional Thin Films, Nano-Materials and MEMS
William Andrew
Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering
CRC Press
Handbook of Advanced Plasma Processing Techniques
Springer
Handbook of Advanced Plasma Processing Techniques
Springer
Low Pressure Plasmas and Microstructuring Technology
Springer
Fundamentals of Vacuum Science and System Design for High and Ultrahigh Vacuum, Volume 1: Introduction to Vacuum and Systems (Vacuum and Thin-Film Deposition Technologies)
Elsevier
Thin Films Material Technology: Sputtering of Compound Materials
Springer
Principles of Plasma Discharges and Materials Processing
Wiley
Plasma Physics: An Introduction to Laboratory, Space, and Fusion Plasmas (Graduate Texts in Physics)
Springer
Low Pressure Plasmas and Microstructuring Technology
Springer
Lecture Notes on Principles of Plasma Processing
Springer
Pulsed Laser Ablation of Solids: Basics, Theory and Applications: 53 (Springer Series in Surface Sciences, 53)
Springer
Pulsed Laser Ablation of Solids: Basics, Theory and Applications: 53 (Springer Series in Surface Sciences, 53)
Springer
Lithium Sputtering, Deposition and Evaporation
VDM Verlag
Plasma Processes for Semiconductor Fabrication: 8 (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering, Series Number 8)
Cambridge University Press
Fundamental Electron Interactions with Plasma Processing Gases (Physics of Atoms and Molecules)
Springer
Plasma Processes for Fabrication: 8 (Cambridge Studies in Semiconductor Physics and Microelectronic Engineering, Series Number 8)
Cambridge University Press
Microwave Plasma Sources and Methods in Processing Technology
Wiley-IEEE Press
Academic Press - Optical Diagnostics for Thin Film Processing
Academic Press
Cluster Ion-Solid Interactions: Theory, Simulation, and Experiment
CRC Press
Sputtering by Particle Bombardment: Experiments and Computer Calculations from Threshold to MeV Energies: 110 (Topics in Applied Physics, 110)
Springer
Sputtering by Particle Bombardment: Experiments and Computer Calculations from Threshold to MeV Energies: 110 (Topics in Applied Physics, 110)
Springer
Plasma Electronics: Applications in Microelectronic Device Fabrication: 26 (Series in Plasma Physics)
CRC Press