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Springer Photoemission from Optoelectronic Materials - Nanostructures

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Description

Explore the cutting edge of nanoscience with this comprehensive guide to photoemission phenomena in optoelectronic materials and their nanostructures. This authoritative Springer publication examines low dimensional structures exhibiting quantum confinement in one, two and three dimensions, including ultrathin films, inversion layers, accumulation layers, quantum well superlattices, quantum well wires, quantum wires superlattices, magneto-size quantizations and quantum dots. Ideal for researchers and engineers working with advanced experimental techniques such as fine line lithography, molecular beam epitaxy and organometallic vapour phase epitaxy, this reference explores both the fundamental physics uncovering new phenomena in nanoscience and the practical applications driving modern optoelectronic device development.

Key Features

Covers photoemission behaviour across quantum confined structures including quantum dots, quantum wells and ultrathin films used in optoelectronic research.

Addresses low dimensional materials fabricated using molecular beam epitaxy, organometallic vapour phase epitaxy and fine line lithographical methods.

Examines both one, two and three dimensional quantum confinement effects critical to understanding nanostructure performance.

Published by Springer as part of the Nanostructure Science and Technology series, providing authoritative technical reference material for advanced researchers.

Product Specifications

Format
hardcover
Domain
Amazon UK
Release Date
01 July 2009
Listed Since
22 May 2009

Barcode

No barcode data available

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