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Meta-Pellicle Wavefront Pre-Correction for High-NA EUV Lithography

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Description

Explore the technical advancements in semiconductor manufacturing with this specialized text on Meta-Pellicle Wavefront Pre-Correction for High-NA EUV Lithography. This work covers essential topics including metasurface pellicles, phase/polarization pre-distortion, and mask 3D shadowing effects. Designed for professionals and researchers in the field of computing and lithography, the content integrates Python as a computational mathematics library to address complex lithography challenges. By focusing on the intersection of metasurface technology and wavefront correction, this resource provides a deep look into the mathematical and computational methods required for next-generation EUV processes. Whether you are studying mask 3D shadowing or implementing phase pre-distortion, this book serves as a technical guide for understanding the computational requirements of modern lithography.

Key Features

Covers advanced concepts in metasurface pellicles and wavefront pre-correction for High-NA EUV lithography.

Provides technical details on phase and polarization pre-distortion techniques.

Addresses the complexities of mask 3D shadowing within the lithography process.

Includes the use of Python as a computational mathematics library for technical applications.

Targeted toward readers interested in programming languages and computational mathematics.

Product Specifications

Format: hardcover
ASIN: B0G92FWPXZ
Category: Books > Subjects > Computing & Internet > Programming > Languages
Domain: Amazon UK
Release Date: 19 December 2025
Listed Since: 19 December 2025

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Meta-Pellicle Wavefront Pre-Correction for High-NA EUV Lithography

Out of stock for 19 days. The last 3 returns each lasted under a day — get on the list.

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