High-NA EUV Imaging and Mask 3D Effects - Python Library Book - Image 1

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High-NA EUV Imaging and Mask 3D Effects - Python Library Book

Applied Optics

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Description

Explore the technical complexities of next-generation semiconductor manufacturing with this specialized resource. This book focuses on High-NA EUV imaging and the specific 3D effects that impact mask production and lithography. It covers essential topics such as 0.55 NA anamorphic optics, reflective reticle dynamics, and absorber shadowing. Readers will gain technical insight into telecentricity error and Bossung tilt, providing a deep look into the challenges of advanced optical systems. To support practical application, the content integrates Python, a computational mathematics library, allowing for the modeling and analysis of these complex optical phenomena. This is a targeted resource for professionals and students in applied optics and electronics engineering who require a mathematical approach to understanding EUV imaging limitations and performance.

Key Features

Covers advanced 0.55 NA anamorphic optics for next-generation imaging requirements.

Analyzes critical 3D effects including absorber shadowing and reflective reticle behavior.

Provides technical details on telecentricity error and Bossung tilt in lithography.

Includes Python computational mathematics library applications for technical modeling.

Targeted content for applied optics and electronics engineering professionals.

Product Specifications

Format: hardcover
ASIN: B0G92BPLZ8
Category: Books > Subjects > Science, Nature & Maths > Engineering & Technology > Electronics & Communications Engineering > Electronics Engineering > Applied Optics
Domain: Amazon UK
Release Date: 19 December 2025
Listed Since: 19 December 2025

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High-NA EUV Imaging and Mask 3D Effects - Python Library Book

Out of stock for 21 days. The last 3 returns each lasted under a day — get on the list.

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