£143.00

CRC Press Machine Learning-Based Modelling in ALD Processes

Name: CRC Press Machine Learning-Based Modelling in ALD Processes
Brand: CRC Press
Price: 143.0 GBP
Availability: InStock

AI & Machine Learning

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Description

Explore the intersection of advanced computing and material science with Machine Learning-Based Modelling in Atomic Layer Deposition Processes. Published by CRC Press as part of the Emerging Materials and Technologies series, this book addresses modern challenges in semiconductor manufacturing and thin-film deposition. By integrating machine learning techniques into atomic layer deposition (ALD) workflows, researchers and engineers can better understand and predict complex chemical processes. This text provides a specialized look at how computational models can enhance the precision and efficiency of material growth. It is an essential resource for professionals working in AI, computer science, and advanced material engineering who need to apply data-driven methods to physical deposition systems.

Key Features

Part of the Emerging Materials and Technologies series for specialized technical learning.

Focuses on the application of machine learning within atomic layer deposition processes.

Published by CRC Press, a trusted name in scientific and technical literature.

Provides insights into modern modelling techniques for material science applications.

Designed for professionals and students in AI, machine learning, and computer science.

Product Specifications

Brand: CRC Press
Format: hardcover
ASIN: 1032386703
Category: Books > Subjects > Computing & Internet > Computer Science > AI & Machine Learning
Domain: Amazon UK
Release Date: 15 December 2023
Listed Since: 07 June 2023

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CRC Press Machine Learning-Based Modelling in ALD Processes

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