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£165.91
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CRC Press Machine Learning in Atomic Layer Deposition - CRC Press
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Most common price: £166 (57 days, 100.0%)
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Description
Key Features
Focuses on machine learning applications specifically tailored for atomic layer deposition (ALD) processes and thin film technology advancement.
Covers both standalone ML-based modelling approaches and integration methods with classical simulation and modelling techniques for comprehensive understanding.
Presents detailed information on ML-based optimisation and prediction strategies to improve ALD process outcomes and material performance.
Published by CRC Press, providing authoritative coverage of emerging materials and technologies in the AI and machine learning field.
Designed for researchers, engineers, and practitioners seeking to apply artificial intelligence techniques to thin film deposition challenges.
Product Specifications
- Brand
- CRC Press
- Format
- hardcover
- ASIN
- 1032386703
- Domain
- Amazon UK
- Release Date
- 15 December 2023
- Listed Since
- 07 June 2023
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