£95.89

Scientific Publishing Industrial Applications Of Ultrafast Lasers: 11 (Materials and Energy)

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Description

Product Description This book describes the application of ultrafast laser science and technology in materials and processing relevant to industry today, including ultrafast laser ablation where fundamental studies have led to the development of the world's first femtosecond photomask repair tool. Semiconductor manufacturing companies worldwide use the tool to repair photomask defects, saving hundreds of millions in production costs. The most up-to-date ultrafast laser technologies are described and methods to generate high harmonics for photoelectron spectroscopy of industrially important materials are covered, with an emphasis on practical laboratory implementation. Basic device physics merged with photoemission studies from single- and polycrystalline materials are described. Extensions to new methods for extracting key device properties of metal-oxide-semiconductor structures, including band offsets, effective work functions, semiconductor band bending and defect-related charging in a number of technologically important gate oxides are detailed. Polycrystalline photovoltaic materials and heterostructures as well as organic light emitting materials are covered. This book describes both the history, and most recent applications of ultrafast laser science to industrially relevant materials, processes and devices. From the Back Cover This book describes the applications of ultrafast laser technology to studies of materials and processes relevant to industry today, including ultrafast laser ablation where fundamental studies led to the development of the world's first femtosecond photomask repair tool. This tool has been successfully employed by a number of semiconductor manufacturing companies worldwide to repair photomask defects, saving hundreds of millions in production costs. Photoelectron spectroscopy utilizing femtosecond pulses of soft and hard coherent X-ray pulses has been used to study ultrafast electron dynamics in materials. Pump/probe photoelectron spectroscopic techniques have been developed to study technologically relevant metal-oxide-semiconductor structures providing key device information such as effective work functions, semiconductor band bending and defect-related charging in technologically important oxides. Additional applications to thin film photovoltaics and organic light emitting materials are covered as well. An overview of different types of ultrafast lasers relevant to industrial uses will be given followed by a basic discussion of the physics and material science of their application.

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