Three-dimensional optical beam lithography for photonic devices - Image 1

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LAP Lambert Academic Publishing Three-dimensional optical beam lithography for photonic devices

Name: Three-dimensional optical beam lithography for photonic devices
Brand: LAP Lambert Academic Publishing
Price: 50.81 GBP
Availability: InStock

Electromagnetism

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Description

When light is used as a tool for an imaging system, diffraction eventually sets a barrier to resolve the smallest details – the diffraction limit, which was first observed in 1873 by a German scientist Ernst Karl Abbe. This ultimate limitation of diffraction also applies when light is used to fabricate artificial structures under the micrometer scale. As a most powerful tool to fabricate artificial structures used to miniature our optoelectronic devices while making them smarter and more capable, light has the unparalleled advantages of three-dimensional carving. However, the diffraction limit says negative when people want to put more components into a certain volume. For example, only several or tens of several gigabytes of data can be put inside a DVD even you use blue ray to record the data. This book introduces a method which can eventually break this limitation by using a two light beams strategy, which has been pursued by people for a long time. The benefit is obvious: smaller components and more compact devices. When this method is used to fabricated integrated circuits, huge cost of the Ultra-violate lithography system could be significantly reduced.

Product Specifications

Brand: LAP Lambert Academic Publishing
Format: paperback
ASIN: 3659953105
Category: Books > Subjects > Science, Nature & Maths > Physics > Electromagnetism
Domain: Amazon UK
Release Date: 13 September 2016
Listed Since: 07 October 2016

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LAP Lambert Academic Publishing Three-dimensional optical beam lithography for photonic devices

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