Woodhead Publishing Nanolithography and Patterning Techniques in Microelectronics (Woodhead Publishing Series in Electronic and Optical Materials)

Currently surface patterning is achieved by means of optical lithographic techniques but with industry moving towards the fabrication of devices with size features of 100nm or less, the technological community is looking for alternative approaches to materials fabrication at the nanoscale. By using nanolithography scientists can drive patterning currents through surfaces while building a 3D structure from a series of patterned layers. Electron induced chemical lithography can create ultra-high resolution templates for the site selective immobilisation of molecules, to form functional, hierarchically, organised structures. This book concentrates on state-of-the-art nanolithographic methods with a particular emphasis on polymer research. Key Features: looks at alternative approaches used to develop complex patterns at the nanoscale; concentrates on state of the art nanolithographic methods; written by a distinguished international team of contributors. Contents: Copolymer ordering; Templated synthesis for controlled 3D structural control; Surface-induced structure formation of polymer blends; Rapid prototyping of functional microfabricated devices by soft lithography; Control of polymer topography; AFM based patterning; Patterning of confined polymer thin films; Ion beam patterning; Nanoprinting techniques; Photolithography beyond the diffraction limit; Standard printing techniques for unconventional methods; Microfluidics; Manipulation of biomolecules and reactions; Fabrication of organic display devices; Printing techniques for plastic electronics. From the Back Cover Techniques such as surface patterning have facilitated the emergence of advanced polymers with applications in areas such as microelectronics. Surface patterning of polymers has conventionally been undertaken by optical lithography. However, a new generation of nanolithographic and patterning techniques has made it possible to develop complex patterns at the nanoscale. Non-conventional lithography and patterning summarises this new range of techniques and their industrial applications. A number of chapters look at ways of forming and modifying surfaces for patterning. These are complemented by chapters on particular patterning techniques such as soft lithography, ion beam patterning, the use of nanostencils, photolithography and inkjet printing. The book also discusses prototyping and the manufacture of particular devices. With its distinguished international team of contributors, Non-conventional lithography and patterning is a standard reference for both those researching and using advanced polymers in such areas as microelectronics and biomedical devices. About the Author Dr David Bucknall is an Associate Professor at the Georgia Institute of Technology. He holds a joint appointment in the School of Polymers, Textiles and Fiber Engineering and the School of Materials Science and Engineering.