£115.00

Photomask and Next-generation Lithography Mask Technology XIII (Proceedings of SPIE)

Applied Optics

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Description

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Product Specifications

Format: Paperback
ASIN: 0819463582
Category: Books > Subjects > Science, Nature & Maths > Engineering & Technology > Electronics & Communications Engineering > Electronics Engineering > Applied Optics
Domain: Amazon UK
Release Date: 01 January 2006
Listed Since: 04 January 2007

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Photomask and Next-generation Lithography Mask Technology XIII (Proceedings of SPIE)

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