CRC Press High-k Materials in Multi-Gate FET Devices (Science, Technology, and Management)

Product Description High-k Materials in Multi-Gate FET Devices focuses on high-k materials for advanced FET devices. It discusses emerging challenges in the engineering and applications and considers issues with associated technologies. It covers the various way of utilizing high-k dielectrics in multi-gate FETs for enhancing their performance at the device as well as circuit level. Provides basic knowledge about FET devices Presents the motivation behind multi-gate FETs, including current and future trends in transistor technologies Discusses fabrication and characterization of high-k materials Contains a comprehensive analysis of the impact of high-k dielectrics utilized in the gate-oxide and the gate-sidewall spacers on the GIDL of emerging multi-gate FET architectures Offers detailed application of high-k materials for advanced FET devices Considers future research directions This book is of value to researchers in materials science, electronics engineering, semiconductor device modeling, IT, and related disciplines studying nanodevices such as FinFET and Tunnel FET and device-circuit codesign issues. About the Author Dr. Shubham Tayal is Associate Professor, Department of Electronics and Communication Engineering, Ashoka Institute of Engineering and Technology. He completed his Ph.D in VLSI from NIT, Kurukshetra. He has contributed 14 (10 - SCI/SCIE, 04 - Others) research papers in international journals, 2 research papers to IEEE Conferences, and 2 research papers to other national conferences. His research interests include simulation and modelling of multi-gate semiconductor devices, device-circuit co-design in digital/analog domain, and low power VLSI design. Dr. Parveen Singla is Professor in Electronics & Communication Engineering, Department of Chandigarh Engineering College- Chandigarh Group of Colleges, Landran, Mohali, Punjab. He did his Bachelor of Engineering in Electronics & Communication Engineering with honors from Maharishi Dayanand University, Rohtak, Master in Technology in Electronics & Communication Engineering with honors from Kurukshetra University, Kurukshetra & PhD in Communication Systems from IKG Punjab Technical University, Jalandhar, India. He has 16 years of experience in the field of teaching and research. He has published more than 35 papers in various reputed journals and national and international conferences. He also organised more than 30 technical events for students in order to enhance their technical skills and received Best International Technical Event Organiser Award. He is the guest editor of various reputed journals. His interest area includes drone technology, wireless networks, smart antennas and soft computing. Dr. J. Paulo Davim received his Ph.D. degree in Mechanical Engineering in 1997, M.Sc. degree in Mechanical Engineering (materials and manufacturing processes) in 1991, Mechanical Engineering degree (5 years) in 1986, from the University of Porto (FEUP), the Aggregate title (Full Habilitation) from the University of Coimbra in 2005 and the D.Sc. (Higher Doctorate) from London Metropolitan University in 2013. He is Senior Chartered Engineer by the Portuguese Institution of Engineers with an MBA and Specialist titles in Engineering and Industrial Management as well as in Metrology. He is also Eur Ing by FEANI-Brussels and Fellow (FIET) of IET-London. Currently, he is Professor at the Department of Mechanical Engineering of the University of Aveiro, Portugal. He is also distinguished as honorary professor in several universities/colleges. He has more than 30 years of teaching and research experience in Manufacturing, Materials, Mechanical and Industrial Engineering, with special emphasis in Machining & Tribology. He has also interest in Management, Engineering Education and Higher Education for Sustainability. He has guided large numbers of postdoc, Ph.D. and master’s students as well as has coordinated and participated in several financed resea